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ARIM Instrument Dictionary
DICE Instrument Dictionary
DICE Materials Data Vocabulary
NIMS Thermophysical Property DB Project Dictionary
Magnetic materials vocabulary
FC System Vocabulary
NIMS XAFS DB Project Materials Dictionary
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FC System Vocabulary
Q3994: FC System Vocabulary
Q3994: FC System Vocabulary
Q3995: (No Label)
Q3995: セル構成
Q3996: (No Label)
Q3996: MEA部材
Q3998: (No Label)
Q3998: 触媒層
Q4189: Loading amount
Q4190: I/C ratio
Q4191: Pt loading ratio
Q4193: Catalyst layer thickness
Q3999: (No Label)
Q3999: 電解質膜
Q4192: Electrolyte membrane thickness
Q4000: GDL/MPL
Q4180: CCM
Q4181: Anode
Q4182: Cathode
Q4183: Catalyst
Q4184: Support
Q4185: Ionomer
Q4186: Sub-gasket
Q4187: Sealing material
Q4188: Radical quencher
Q3997: セパレータ
Q4001: (No Label)
Q4001: 実験・評価
Q4002: (No Label)
Q4002: セル作製
Q4004: (No Label)
Q4004: MEA作製
Q4194: Water/Solvent ratio
Q4195: Water/Alcohol ratio
Q4196: Weight solid fraction
Q4197: Volume solid fraction
Q4198: Coating method
Q4199: Number of coatings
Q4200: Opening ratio
Q4201: Material thickness
Q4202: Blade gap
Q4248: Viscosity Up, 30rpm
Q4249: Viscosity Up, 60rpm
Q4250: Viscosity Down, 30rpm
Q4251: Viscosity Down, 60rpm
Q4252: Particle size number median diameter
Q4253: Particle size number average diameter
Q4005: (No Label)
Q4005: 評価セル
Q4203: Cell area
Q4204: Separator material
Q4205: Flow channel shape
Q4206: Rib width
Q4207: Channel width
Q4208: Flow channel length
Q4209: Cell clamping pressure
Q4003: (No Label)
Q4003: セル評価
Q4006: (No Label)
Q4006: セル評価手法
Q4232: Conditioning
Q4233: IV (Current-Voltage)
Q4234: CV (Cyclic Voltammetry)
Q4235: LSV (Linear Sweep Voltammetry)
Q4236: ORR (Oxygen Reduction Reaction)
Q4237: EIS (Electrochemical Impedance Spectroscopy)
Q4238: COSV (Chronoamperometry with Step Voltage)
Q4239: Load response durability test
Q4240: Start-stop durability
Q4241: OCV durability
Q4242: Pressurized OCV durability
Q4243: Dry-wet cycle durability
Q4007: (No Label)
Q4007: セル評価条件
Q4210: Back pressure
Q4211: Gas flow rate
Q4212: Dew point
Q4213: Humidifier temperature
Q4214: Cell temperature
Q4215: Gas
Q4216: Relative humidity
Q4217: Gas purge time
Q4218: Hydrogen partial pressure
Q4219: Oxygen partial pressure
Q4220: Constant potential
Q4221: Voltage range
Q4222: Constant current
Q4223: Constant voltage (current) hold time
Q4224: Amplitude
Q4225: Response
Q4226: Current limit
Q4227: Scan rate
Q4228: Current range
Q4229: Number of measurements
Q4230: Gas utilization rate
Q4231: Reference electrode
Q4008: (No Label)
Q4008: 評価装置
Q4244: Evaluation device
Q4245: Potentiostat/Galvanostat
Q4246: Electronic load device
Q4247: AC resistance meter
Q4009: (No Label)
Q4009: 特性・物性
Q4010: セル特性
Q4011: 材料物性・特性