Q4001: 実験・評価
Vocabulary ID
http://matvoc.nims.go.jp/entity/Q4001
| Language | Label | Description | Alias |
|---|---|---|---|
| English | (No Label) | - | - |
| Japanese | 実験・評価 | - | - |
| Language | English |
|---|---|
| Label | (No Label) |
| Description | |
| Alias |
| Language | Japanese |
|---|---|
| Label | 実験・評価 |
| Description | |
| Alias |
Semantic Relatives
Parents
Children
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Q4002: セル作製
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Q4004: MEA作製
- Q4194: Water/Solvent ratio
- Q4195: Water/Alcohol ratio
- Q4196: Weight solid fraction
- Q4197: Volume solid fraction
- Q4198: Coating method
- Q4199: Number of coatings
- Q4200: Opening ratio
- Q4201: Material thickness
- Q4202: Blade gap
- Q4248: Viscosity Up, 30rpm
- Q4249: Viscosity Up, 60rpm
- Q4250: Viscosity Down, 30rpm
- Q4251: Viscosity Down, 60rpm
- Q4252: Particle size number median diameter
- Q4253: Particle size number average diameter
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Q4003: セル評価
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Q4006: セル評価手法
- Q4232: Conditioning
- Q4233: IV (Current-Voltage)
- Q4234: CV (Cyclic Voltammetry)
- Q4235: LSV (Linear Sweep Voltammetry)
- Q4236: ORR (Oxygen Reduction Reaction)
- Q4237: EIS (Electrochemical Impedance Spectroscopy)
- Q4238: COSV (Chronoamperometry with Step Voltage)
- Q4239: Load response durability test
- Q4240: Start-stop durability
- Q4241: OCV durability
- Q4242: Pressurized OCV durability
- Q4243: Dry-wet cycle durability
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Q4007: セル評価条件
- Q4210: Back pressure
- Q4211: Gas flow rate
- Q4212: Dew point
- Q4213: Humidifier temperature
- Q4214: Cell temperature
- Q4215: Gas
- Q4216: Relative humidity
- Q4217: Gas purge time
- Q4218: Hydrogen partial pressure
- Q4219: Oxygen partial pressure
- Q4220: Constant potential
- Q4221: Voltage range
- Q4222: Constant current
- Q4223: Constant voltage (current) hold time
- Q4224: Amplitude
- Q4225: Response
- Q4226: Current limit
- Q4227: Scan rate
- Q4228: Current range
- Q4229: Number of measurements
- Q4230: Gas utilization rate
- Q4231: Reference electrode
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