Q4003: セル評価
Vocabulary ID
http://matvoc.nims.go.jp/entity/Q4003
| Language | Label | Description | Alias |
|---|---|---|---|
| English | (No Label) | - | - |
| Japanese | セル評価 | - | - |
| Language | English |
|---|---|
| Label | (No Label) |
| Description | |
| Alias |
| Language | Japanese |
|---|---|
| Label | セル評価 |
| Description | |
| Alias |
Semantic Relatives
Parents
Children
-
Q4006: セル評価手法
- Q4232: Conditioning
- Q4233: IV (Current-Voltage)
- Q4234: CV (Cyclic Voltammetry)
- Q4235: LSV (Linear Sweep Voltammetry)
- Q4236: ORR (Oxygen Reduction Reaction)
- Q4237: EIS (Electrochemical Impedance Spectroscopy)
- Q4238: COSV (Chronoamperometry with Step Voltage)
- Q4239: Load response durability test
- Q4240: Start-stop durability
- Q4241: OCV durability
- Q4242: Pressurized OCV durability
- Q4243: Dry-wet cycle durability
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Q4007: セル評価条件
- Q4210: Back pressure
- Q4211: Gas flow rate
- Q4212: Dew point
- Q4213: Humidifier temperature
- Q4214: Cell temperature
- Q4215: Gas
- Q4216: Relative humidity
- Q4217: Gas purge time
- Q4218: Hydrogen partial pressure
- Q4219: Oxygen partial pressure
- Q4220: Constant potential
- Q4221: Voltage range
- Q4222: Constant current
- Q4223: Constant voltage (current) hold time
- Q4224: Amplitude
- Q4225: Response
- Q4226: Current limit
- Q4227: Scan rate
- Q4228: Current range
- Q4229: Number of measurements
- Q4230: Gas utilization rate
- Q4231: Reference electrode