Q4306: OCV durability
Vocabulary ID
http://matvoc.nims.go.jp/entity/Q4306
Language | Label | Description | Alias |
---|---|---|---|
English | OCV durability | - | - |
Japanese | OCV耐久 | - | - |
Language | English |
---|---|
Label | OCV durability |
Description | |
Alias |
Language | Japanese |
---|---|
Label | OCV耐久 |
Description | |
Alias |
Semantic Relatives
Parents
Q0: Others (Items with no parent or child)
Siblings:- Q2: Resource
- Q3: National Institute for Materials Science
- Q4: Materials Data Platform
- Q5: DPF dictionary
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- Q8: properties dictionary
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- Q36: crystalographic structure
- Q41: license
- Q43: dummy dictionary
- Q50: chemical state
- Q53: qualitative analysis
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- Q189: open-framework
- Q509: DPFC expansion of the Materials Data Vocabulary
- Q510: quantitative analysis
- Q511: surface analysis
- Q512: elemental analysis
- Q513: in vacuum
- Q514: Peak Center
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- Q518: quantity
- Q519: time
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- Q538: Creative Commons Public Domain Mark 1.0
- Q539: Apache License 2.0
- Q540: GNU General Public License
- Q541: MIT License
- Q542: in atmosphere
- Q543: in liquid
- Q544: in inert gas
- Q545: crystal structure
- Q549: environment
- Q552: in vacuum
- Q553: in high pressure
- Q554: in magnetic field
- Q555: at low temperature
- Q556: polycrystal
- Q557: FCC particles on amorphous film
- Q558: characterization instruments
- Q559: microscope
- Q560: analytical electron microscope
- Q561: synthesis and processing instruments
- Q562: deposition and coating instruments
- Q563: spin coater
- Q643: biological property
- Q644: distribution
- Q645: electronic property
- Q646: environmental analysis
- Q647: failure analysis
- Q648: impurity analysis
- Q649: magnetic property
- Q650: optical property
- Q651: physical property
- Q652: theoretical simulation
- Q658: 散乱理論
- Q678: analysis field
- Q679: NIMS MDPF Common Messaging Format
- Q684: unit of measure
- Q688: crystallographic analysis
- Q694: copper(II) chloride
- Q716: XAFS DB Project in NIMS
- Q1863: RIKEN KEIKI Dataset Dictionary
- Q1881: NGC system registration law
- Q2839: Glow Discharge Mass Spectrometry
- Q3054: (test)スペクトル最適化
- Q3056: half width at half maximum
- Q3057: height
- Q3058: position
- Q3059: Lorentz-Gauss mixing ratio
- Q3060: area
- Q3519: Thermophysical Property Database Project in NIMS
- Q3623: Yb2O3
- Q3624: Ni-10at%Ti
- Q3625: Ni-60at%Ti
- Q3626: Y2O3
- Q3634: Starrydata vocabulary
- Q3694: Calcium sulfate Hydrous
- Q3695: Scotch tape
- Q3696: Sulfate green rust
- Q3697: Arsenic sulfide
- Q3698: Arsenic (III) oxide
- Q3699: Sodium selenite
- Q3700: Slawsonite
- Q3701: Monteponite
- Q3702: Europium(II) titanate
- Q3703: Europium(II) selenide
- Q3955: Nickel(II) hydroxide
- Q3970: Trivanesium tetrasulfide
- Q3971: Vanadium oxide
- Q3972: Vanadium (Ⅲ) sulfide
- Q3973: Sodium chromate
- Q3974: Cobalt(III) oxide
- Q3975: Hydroxy(oxo)cobalt
- Q3976: alpha-Nickel hydroxide
- Q3977: beta-Nickel hydroxide
- Q3978: Nickel(II) hydroxide
- Q3979: Hydroxy(oxo)nickel
- Q3980: Nickel Phosphorus Trisulfide
- Q3981: Copper;molecular oxygen
- Q3982: Gallium
- Q3983: Strontium
- Q3984: Oxoruthenium
- Q3985: Gold(I) chloride
- Q3986: Mercury
- Q3987: Lead(II) Bromide
- Q3988: Lanthanum
- Q3989: Cerium
- Q3990: Praseodymium
- Q3991: Thorium
- Q3992: Uranium
- Q4029: CPDDB Materials Type Dictionary
- Q4042: Sulfanylbenzoic acid
- Q4043: Arsenate
- Q4044: Arsenic acid
- Q4045: Arsonic acid
- Q4046: Arsenite
- Q4047: Iodate
- Q4092: Chromium(II) sulfide
- Q4094: Chromium(III) sulfate
- Q4096: Manganese(IV) disulfide
- Q4098: Chalcopyrite
- Q4107: Iron(III) phosphate dihydrate
- Q4109: Iron(III) pyrophosphate
- Q4110: Iron(III) sulfate
- Q4138: Monomethylarsonic acid
- Q4153: Selenium disulfide
- Q4179: 技術研究組合FC-Cubic
- Q4254: Loading amount
- Q4255: I/C ratio
- Q4256: Pt loading ratio
- Q4257: Electrolyte membrane thickness
- Q4258: Catalyst layer thickness
- Q4259: Water/Solvent ratio
- Q4260: Water/Alcohol ratio
- Q4261: Weight solid fraction
- Q4262: Volume solid fraction
- Q4263: Coating method
- Q4264: Number of coatings
- Q4265: Opening ratio
- Q4266: Material thickness
- Q4267: Blade gap
- Q4268: Cell area
- Q4269: Separator material
- Q4270: Flow channel shape
- Q4271: Rib width
- Q4272: Channel width
- Q4273: Flow channel length
- Q4274: Cell clamping pressure
- Q4275: Back pressure
- Q4276: Gas flow rate
- Q4277: Dew point
- Q4278: Humidifier temperature
- Q4279: Cell temperature
- Q4280: Gas
- Q4281: Relative humidity
- Q4282: Gas purge time
- Q4283: Hydrogen partial pressure
- Q4284: Oxygen partial pressure
- Q4285: Constant potential
- Q4286: Voltage range
- Q4287: Constant current
- Q4288: Constant voltage (current) hold time
- Q4289: Amplitude
- Q4290: Response
- Q4291: Current limit
- Q4292: Scan rate
- Q4293: Current range
- Q4294: Number of measurements
- Q4295: Gas utilization rate
- Q4296: Reference electrode
- Q4297: Conditioning
- Q4298: IV (Current-Voltage)
- Q4299: CV (Cyclic Voltammetry)
- Q4300: LSV (Linear Sweep Voltammetry)
- Q4301: ORR (Oxygen Reduction Reaction)
- Q4302: EIS (Electrochemical Impedance Spectroscopy)
- Q4303: COSV (Chronoamperometry with Step Voltage)
- Q4304: Load response durability test
- Q4305: Start-stop durability
- Q4307: Pressurized OCV durability
- Q4308: Dry-wet cycle durability
- Q4309: Evaluation device
- Q4310: Potentiostat/Galvanostat
- Q4311: Electronic load device
- Q4312: AC resistance meter
- Q4313: Viscosity Up, 30rpm
- Q4314: Viscosity Up, 60rpm
- Q4315: Viscosity Down, 30rpm
- Q4316: Viscosity Down, 60rpm
- Q4317: Particle size number median diameter
- Q4318: Particle size number average diameter
- Q4319: Loading amount
- Q4320: I/C ratio
- Q4321: Pt loading ratio
- Q4322: Electrolyte membrane thickness
- Q4323: Catalyst layer thickness
- Q4324: Water/Solvent ratio
- Q4325: Water/Alcohol ratio
- Q4326: Weight solid fraction
- Q4327: Volume solid fraction
- Q4328: Coating method
- Q4329: Number of coatings
- Q4330: Opening ratio
- Q4331: Material thickness
- Q4332: Blade gap
- Q4333: Cell area
- Q4334: Separator material
- Q4335: Flow channel shape
- Q4336: Rib width
- Q4337: Channel width
- Q4338: Flow channel length
- Q4339: Cell clamping pressure
- Q4340: Back pressure
- Q4341: Gas flow rate
- Q4342: Dew point
- Q4343: Humidifier temperature
- Q4344: Cell temperature
- Q4345: Gas
- Q4346: Relative humidity
- Q4347: Gas purge time
- Q4348: Hydrogen partial pressure