Language	Label	Description	Alias
English	Electrolyte membrane thickness	-	-
Japanese	電解質膜厚さ	-	-

Language	English
Label	Electrolyte membrane thickness
Description
Alias

Language	Japanese
Label	電解質膜厚さ
Description
Alias

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• Q544: in inert gas
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• Q3698: Arsenic (III) oxide
• Q3699: Sodium selenite
• Q3700: Slawsonite
• Q3701: Monteponite
• Q3702: Europium(II) titanate
• Q3703: Europium(II) selenide
• Q3955: Nickel(II) hydroxide
• Q3970: Trivanesium tetrasulfide
• Q3971: Vanadium oxide
• Q3972: Vanadium (Ⅲ) sulfide
• Q3973: Sodium chromate
• Q3974: Cobalt(III) oxide
• Q3975: Hydroxy(oxo)cobalt
• Q3976: alpha-Nickel hydroxide
• Q3977: beta-Nickel hydroxide
• Q3978: Nickel(II) hydroxide
• Q3979: Hydroxy(oxo)nickel
• Q3980: Nickel Phosphorus Trisulfide
• Q3981: Copper;molecular oxygen
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• Q4029: CPDDB Materials Type Dictionary
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• Q4045: Arsonic acid
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• Q4047: Iodate
• Q4092: Chromium(II) sulfide
• Q4094: Chromium(III) sulfate
• Q4096: Manganese(IV) disulfide
• Q4098: Chalcopyrite
• Q4107: Iron(III) phosphate dihydrate
• Q4109: Iron(III) pyrophosphate
• Q4110: Iron(III) sulfate
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• Q4153: Selenium disulfide
• Q4179: 技術研究組合FC-Cubic
• Q4254: Loading amount
• Q4255: I/C ratio
• Q4256: Pt loading ratio
• Q4258: Catalyst layer thickness
• Q4259: Water/Solvent ratio
• Q4260: Water/Alcohol ratio
• Q4261: Weight solid fraction
• Q4262: Volume solid fraction
• Q4263: Coating method
• Q4264: Number of coatings
• Q4265: Opening ratio
• Q4266: Material thickness
• Q4267: Blade gap
• Q4268: Cell area
• Q4269: Separator material
• Q4270: Flow channel shape
• Q4271: Rib width
• Q4272: Channel width
• Q4273: Flow channel length
• Q4274: Cell clamping pressure
• Q4275: Back pressure
• Q4276: Gas flow rate
• Q4277: Dew point
• Q4278: Humidifier temperature
• Q4279: Cell temperature
• Q4280: Gas
• Q4281: Relative humidity
• Q4282: Gas purge time
• Q4283: Hydrogen partial pressure
• Q4284: Oxygen partial pressure
• Q4285: Constant potential
• Q4286: Voltage range
• Q4287: Constant current
• Q4288: Constant voltage (current) hold time
• Q4289: Amplitude
• Q4290: Response
• Q4291: Current limit
• Q4292: Scan rate
• Q4293: Current range
• Q4294: Number of measurements
• Q4295: Gas utilization rate
• Q4296: Reference electrode
• Q4297: Conditioning
• Q4298: IV (Current-Voltage)
• Q4299: CV (Cyclic Voltammetry)
• Q4300: LSV (Linear Sweep Voltammetry)
• Q4301: ORR (Oxygen Reduction Reaction)
• Q4302: EIS (Electrochemical Impedance Spectroscopy)
• Q4303: COSV (Chronoamperometry with Step Voltage)
• Q4304: Load response durability test
• Q4305: Start-stop durability
• Q4306: OCV durability
• Q4307: Pressurized OCV durability
• Q4308: Dry-wet cycle durability
• Q4309: Evaluation device
• Q4310: Potentiostat/Galvanostat
• Q4311: Electronic load device
• Q4312: AC resistance meter
• Q4313: Viscosity Up, 30rpm
• Q4314: Viscosity Up, 60rpm
• Q4315: Viscosity Down, 30rpm
• Q4316: Viscosity Down, 60rpm
• Q4317: Particle size number median diameter
• Q4318: Particle size number average diameter
• Q4319: Loading amount
• Q4320: I/C ratio
• Q4321: Pt loading ratio
• Q4322: Electrolyte membrane thickness
• Q4323: Catalyst layer thickness
• Q4324: Water/Solvent ratio
• Q4325: Water/Alcohol ratio
• Q4326: Weight solid fraction
• Q4327: Volume solid fraction
• Q4328: Coating method
• Q4329: Number of coatings
• Q4330: Opening ratio
• Q4331: Material thickness
• Q4332: Blade gap
• Q4333: Cell area
• Q4334: Separator material
• Q4335: Flow channel shape
• Q4336: Rib width
• Q4337: Channel width
• Q4338: Flow channel length
• Q4339: Cell clamping pressure
• Q4340: Back pressure
• Q4341: Gas flow rate
• Q4342: Dew point
• Q4343: Humidifier temperature
• Q4344: Cell temperature
• Q4345: Gas
• Q4346: Relative humidity
• Q4347: Gas purge time
• Q4348: Hydrogen partial pressure