Difference between revisions of "exposure (Q3400)"

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(‎Created a new Item)
 
(‎Created claim: has broader (P8): lithography (Q465))
 
(One intermediate revision by the same user not shown)
label / jalabel / ja
 +
露光
Property / has broader
 +
Property / has broader: lithography / rank
 +
Normal rank
Property / has broader: lithography / reference
 +

Latest revision as of 00:20, 6 March 2023

No description defined
Language Label Description Also known as
English
exposure
No description defined

    Statements