exposure (Q3400): Difference between revisions
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(Created a new Item) |
(Created claim: has broader (P8): lithography (Q465)) |
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| (One intermediate revision by the same user not shown) | |||
| label / ja | label / ja | ||
露光 | |||
| Property / has broader | |||
| Property / has broader: lithography / rank | |||
Normal rank | |||
| Property / has broader: lithography / reference | |||
Latest revision as of 00:20, 6 March 2023
No description defined
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | exposure |
No description defined |