Difference between revisions of "exposure (Q3400)"
Jump to navigation
Jump to search
(Created a new Item) |
(Created claim: has broader (P8): lithography (Q465)) |
||
| (One intermediate revision by the same user not shown) | |||
| label / ja | label / ja | ||
| + | 露光 | ||
| Property / has broader | |||
| + | |||
| Property / has broader: lithography / rank | |||
| + | Normal rank | ||
| Property / has broader: lithography / reference | |||
| + | |||
Latest revision as of 00:20, 6 March 2023
No description defined
| Language | Label | Description | Also known as |
|---|---|---|---|
| English |
exposure
|
No description defined
|