Q3358: metal organic chemical vapor deposition
Vocabulary ID
http://matvoc.nims.go.jp/entity/Q3358
| Language | Label | Description | Alias |
|---|---|---|---|
| English | metal organic chemical vapor deposition | - | MOCVD |
| Japanese | 有機金属気相成長法 | - | - |
| Language | English |
|---|---|
| Label | metal organic chemical vapor deposition |
| Description | |
| Alias | MOCVD |
| Language | Japanese |
|---|---|
| Label | 有機金属気相成長法 |
| Description | |
| Alias |
Semantic Relatives
Parents
Q434: deposition and coating
Siblings:- Q435: atomic layer deposition
- Q436: carbon evaporation coating
- Q437: chemical vapor deposition
- Q438: electrodeposition
- Q439: electron beam deposition
- Q440: evaporation
- Q441: gold-sputter coating
- Q442: ink-jet deposition
- Q443: ion beam deposition
- Q444: Langmuir-Blodgett film deposition
- Q445: physical vapor deposition
- Q446: plasma spraying
- Q447: pulsed laser deposition
- Q448: splatter
- Q449: spin coating
- Q450: sputter coating
- Q494: solvent casting
- Q3356: heat vapor deposition
- Q3357: vacuum deposition
- Q3360: hot spray
- Q3361: cold spray
- Q3362: carburizing
- Q3363: nitriding
- Q3364: sulfurization
- Q3365: surface treatment
- Q3366: surface hardening
- Q3367: other surface layer formation technology